22nd International Conference on Atomic Layer Deposition (ALD 2022)

(12-11-2021) The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) .

The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. The conference will take place Sunday, June 26-Wednesday, June 29, 2022, at the International Convention Center (ICC) Ghent in Ghent, Belgium.

 

Abstract Submission Deadline is on February 3, 2022.